In silicon photonics devices such as photonic integrated circuits, line edge roughness (LER) is a primary driver of optical signal loss. LER specifications for these devices are often sub-nanometer, even though feature sizes are typically much larger than leading-edge semiconductor nodes. That combination makes accurate LER measurement both uniquely challenging and critically important.

Minimizing LER in components such as waveguides requires coordinated optimization across device design, OPC, process development and process control. Each of these levers depends on accurate LER measurements. Without accurate measurements, device and process teams are optimizing blind, which often results in months of delayed development time and sub-optimal manufactured devices.

Fractilia's solutions are trusted by photonics and quantum device makers across the development and manufacturing lifecycle including device design and simulation, process development and optimization and production monitoring and control.

Fractilia uses the same proprietary computational metrology technology that powers measurements for leading-edge semiconductor fabs to deliver the highest-accuracy LER and other stochastic metrology data available for photonics applications.