Find and Solve Your Stochastics Issues Faster

MetroLER™ – The Industry Standard for Accurate Stochastics Measurement in R&D

MetroLER™ is the industry's leading software for accurate measurement of unbiased line edge roughness (LER), linewidth roughness (LWR), local critical dimension uniformity (LCDU), critical dimension (CD) and dozens of other stochastic metrics from SEM images.

MetroLER supports R&D, process development and fab ramp through process optimization, SEM tool qualification, resist and material selection and OPC model calibration.

MetroLER is trusted by more than 30 companies, including semiconductor device manufacturers, photonics and waveguide device manufacturers, process tool vendors, metrology tool vendors and resist and material vendors.

Measure populations grouped by proximity effects

Measure and subtract out across-SEM field effects

Accurately compare different resists and materials

Predict missing holes in minutes rather than days

MetroLER analyzes images from any SEM to produce the most accurate measurements of stochastics.

(Investigation and all SEM images in collaboration with imec.)

BENEFITS

Faster process development

MetroLER quickly and accurately identifies the optimal process conditions that minimize roughness, defectivity, LCDU, SEM overlay and other metrics impacted by the effects of stochastics. Use cases include optimizing the scanner as well as etch and metrology tool settings.

Material evaluation and selection

Use MetroLER to optimize the selection of resists and other materials by minimizing the impact of roughness and stochastics.

Reduce resist shrinkage and increase metrology tool throughput

Since MetroLER can provide accurate results even for high-noise and low contrast images, it can be used to make measurements at a lower SEM dose. This results in less resist shrinkage and higher SEM throughput.

Defectivity Measurement
& Analysis

MetroLER automatically detects bridges and breaks for line/space patterns as well as missing and merged contacts and pillars. MetroLER predicts the fraction of missing contacts and can be used to compare and optimize processes for minimum defectivity.

Stop Chasing Noise

Customers who use MetroLER throughout their organization report significant savings by standardizing their measurement methodology using Fractilia. Each engineer can save hours per week and spend more time solving real process problems rather than chasing noise in their measurements.

SEM tool fleet matching

MetroLER measures SEM errors (including noise, distortion, background variation and scan errors) and can be used to perform metrology tool troubleshooting and fleet matching, even across SEM vendors and SEM models.

Migrate your R&D measurements to production

When you're ready to move from process development to pilot line or high-volume manufacturing, reuse every MetroLER measurement for process monitoring and control with FAME™, Fractilia's fab-wide measurement platform.