Data-driven decisions can only be as good as your data.
Historically, SEM metrology solutions have focused on providing high precision. But with stochastics comprising more than 1/2 of the total error budget for current technology nodes, it is now critical to measure what is actually on the wafer with accuracy, not just precision.
Fractilia solves this problem. Using our patented edge detection technology with true computational metrology, MetroLER allows you to measure what is on the wafer, not what is on the SEM image.
The benefits are enormous.
MetroLER version 2 — Measure what is on the wafer, not what is on the SEM image
MetroLER version 2 uses our second-generation patented FILM technology to provide:
The de-facto industry standard for unbiased roughness measurements and PSD analysis
A leap forward in defectivity measurements on massive data sets including missing/merged contacts or pillars as well as line bridges and breaks
Accurate measurement of CD, overlay, local CDU, global CDU, CD error, pattern placement error, edge placement error, within-feature LWR, and many others
Measurement and removal of systematic and random SEM errors to enable metrology tool fleet matching, tool monitoring, and across-vendor matching
Accuracy on any patterning technology at any node: EUV, 193, 193i, SADP, SAQP, SAOP, DSA, and more
Measurement of masks and wafers at any process step (e.g., resist, etch trim, final etch) as well as automated comparison of results through process steps
Measurement of images from most tools: CD SEM, SEM Review, AFM, etc.
More accurate calibration of OPC models
Self-calibrating measurements with no user-defined input parameters
MetroLER is a standalone software tool that runs on Windows 7 or Windows 10.
Unbiased Roughness Measurements
MetroLER: the de facto industry standard for unbiased roughness measurements
If your issues relate to LWR, LER, roughness or stochastics, MetroLER provides by far the most accurate measurements and analysis.
MetroLER uses the patented FILM edge detection technology to accurately measure and remove the SEM noise, which results in the most accurate unbiased roughness measurements. MetroLER measures and analyzes the full PSD and outputs critical unbiased metrics such as LWR 3-sigma, PSD(0), and Correlation Length.
Using MetroLER you can confidently compare unbiased roughness measurements across different resists, different process conditions and even different models and manufacturers of SEM tools.
Defectivity Measurement and Analysis
A leap forward in defectivity measurements on small to massive data sets
Do you need to quantitatively measure the defectivity rates of your processes? Whether you have one SEM image or thousands, MetroLER provides the most accurate analysis available.
MetroLER automatically detects bridges and breaks for line/space patterns as well as missing and merged contacts and pillars. The software identifies the location of the defects and outputs a table of the sizes and locations of the bridges and breaks as well as statistics related to the defects. In addition, you can view meaningful plots such as stacked contours for multiple populations.
Other Key Measurements
In addition to roughness and defectivity measurements, MetroLER also outputs many other key measurements and metrics, including:
For lines/spaces: CD and pitch, edge-to-edge correlations, Local CDU, Global CDU, bridges and breaks per mm
For contacts and pillars: X and Y CD, Area, Ellipticity, Eccentricity, Local CDU, Local EPE, Pattern Placement Error, Global CDU, Fraction of merged/missing features, stacked contours
Overlay errors including pitch walking
SEM field distortion, systematic across-field CD errors, and SEM noise characteristics
Measurements for up to 8 individual populations per image batch
Across-wafer and across-die analysis
Full design-of-experiments support
And many others.
Take the SEM out of your SEM measurements
FILM — an enabling technology
MetroLER uses our second-generation patented Fractilia Inverse Linescan Model (FILM™). FILM is a physics-based algorithm for edge detection that rejects noise without resorting to statistical filtering or smoothing. The result is robust edge detection without modifying the true characteristics of the feature edge you are detecting.
Measuring and subtracting out SEM errors
The noise in a SEM image adds to the uncertainty of the feature to produce an inflated, biased roughness measurement. MetroLER fixes this problem by measuring the random noise in an SEM image and then statistically subtracting it out to produce a far more accurate unbiased measurement. Systematic SEM errors are also measured and removed.
No user-defined parameters
Unlike other tools, MetroLER is self-calibrating and requires no user-defined input parameters. This means that you will receive the same accurate measurements regardless of who is performing the analysis. In addition, all measurements and analyses are completely repeatable.
Accurate measurements across wafer process and SEM conditions
The results from other measurement tools are affected by process conditions making it difficult to determine the accurate measurements and optimal process conditions. MetroLER solves this problem by subtracting SEM errors across the range of conditions. With MetroLER you know what is on the wafer, not just what is on the SEM image.