Pattern roughness is one of the most pressing issues for semiconductor manufacturing since it can significantly decrease yield and increase cost.
Traditional measurement approaches have reached the limits of uncertainty and accuracy and are inadequate for roughness measurements. Since you cannot fix what you cannot measure, a new solution is required.
Computational metrology changes everything. Using our patented computational metrology technology, we have created MetroLER — the most accurate software tool for measuring roughness and other metrics.
If you are not using MetroLER, you should not trust your roughness measurement results.