The industry standard for stochastic variability measurement and control
Trusted by 30+ semiconductor and photonics companies worldwide
Stochastic variability – including line edge roughness (LER), linewidth roughness (LWR), local critical dimension uniformity (LCDU), local edge placement error (LEPE) and defectivity – now accounts for more than 50% of patterning errors in advanced semiconductor and photonics devices. As nodes shrink, the problem compounds.
Fractilia's measurement solutions for R&D and manufacturing give device makers, tool vendors, mask makers, resist companies and others the tools they need to quantify, optimize and control this variability, from R&D through high-volume manufacturing.
Fractilia's proprietary computational metrology technology enables the most accurate and precise measurement of stochastics as well as distance metrics such as critical dimensions (CD), tip-to-tip and other measurements. In addition, by accurately measuring and removing the effects of SEM noise from measurements, our products also enable dozens of other process and tool optimization benefits such as significantly improved SEM tool-to-tool matching and SEM fleet monitoring.
Fractilia’s measurement solutions are used throughout device lifecycle and are the de facto industry standard for semiconductor and photonics devices.
Trusted by 30+ leading companies across semiconductor and photonics manufacturing, including IDMs, fabless designers, tool vendors, resist suppliers, and others.
Numerous customer benefits from R&D through manufacturing.
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the stochastics resolution gap
The semiconductor industry is losing billions of dollars to a measurement problem most fabs don't fully see yet. Inaccurate stochastics measurement leads to suboptimal process decisions, yield loss and other issues, and the gap widens with every new device generation.
Closing the gap starts with measurement accuracy. As the saying goes: you can't control what you can't measure.