EUV's New Problem Areas, by Mark Lapedus in Semiconductor Engineering

February 19, 2018: Contact hole measurement and analysis capability released in MetroLER version 1.5

See MetroLER results at the 2018 SPIE Advanced Lithography Conference: Download a schedule of technical papers with results from MetroLER -- Updated February 21, 2018

Conquering LER with computational metrologyChris Mack's video conversation with Dan Hutcheson on weVISION

July 6, 2017: Fractilia releases MetroLER version 1.0

Fractilia: Pattern Roughness Metrology, by Mark Lapedus in Semiconductor Engineering

SPIE Newsroom video:  Chris Mack -- Stochastics and the phenomenon of line-edge roughness

SPIE Newsroom video on Fractilia