The industry standard for stochastics measurements

Proven proprietary technologies

In order to optimize and control stochastics, fabs must first measure them accurately. But standard measurement methods cannot provide the accuracy and precision required. 

Fractilia solves this problem. By combining the patented fourth-generation FILM™ technology with true computational metrology, Fractilia’s products measure all major stochastic effects simultaneously with the accuracy and precision needed to develop and control manufacturing processes.

Highest-Accuracy Stochastics & CD Measurements

  • Industry standard - highest accuracy and robustness

  • Unique physics-based models provide ground-truth measurements

  • Measure SEM images from any tool vendor and tool model

  • Automatically deconvolve on-wafer effects from SEM tool noise

  • 19+ patents and hundreds of trade secrets

Lithography and Patterning Expertise

  • The most accurate rigorous process window analysis

  • Physics-based prediction of defectivity

  • Automated analysis of SADP/SAQP processes

  • Accurate for EUV, High-NA EUV, 193, 193i, 248, i-line processes

  • Lithography, etch, CVD and other process analysis

  • Multiple patents

Rigorous Statistical Analysis

  • More than 250 measurements from every batch of SEM images

  • Every measurement includes accurate error bars

  • Accurately compare results from different materials, process steps and SEM tools

  • Control HVM processes more accurately after removal of SEM noise

FILM™ — an enabling technology

Fractilia’s patented FILM™ technology is a physics-based algorithm for edge detection that rejects noise without resorting to image filtering or smoothing. The result is robust edge detection without modifying the true characteristics of the feature edge you are detecting.

Highest signal to noise

Fractilia’s fourth-generation FILM model provides the highest signal-to-noise of any edge detection methodology in the industry.

Measures and subtracts out SEM errors

The noise in a SEM image adds to the uncertainty of the measurement and produces an inflated, biased result. The amount of this noise changes with nearly everything — process conditions (e.g., dose/focus), feature size, SEM settings, SEM tools, etc. Fractilia solves this problem by measuring the random noise in a SEM image and then statistically removing the noise to produce a far more accurate unbiased measurement. Systematic SEM errors are also measured and removed.

No user-defined parameters

Unlike other tools, Fractilia’s products are self-calibrating and require no user-defined input parameters. This capability allows all measurements to be fully automated and provides the same accurate results across all users. In addition, all measurements and analyses are completely repeatable.

Robust solutions

Our FAME™ and MetroLER™ products also include hundreds of other unique and proprietary capabilities that have been developed and tested on millions of SEM images by customers worldwide over many years. Our attention to detail results in the most accurate, robust and easy-to-use products available.

TOTAL SEM IMAGES MEASURED BY FRACTILIA

(ANNUALLY AT ALL CUSTOMERS)

Fractilia has seen exponential growth in the number of SEM images measured by customers using its products.

Measure the wafer, not the image

Fractilia’s solutions provide:

  • The de-facto industry standard for unbiased roughness measurements (LWR, LER, PSD(0), etc.)

  • High-precision CD measurement, with systematic and random SEM errors removed

  • Extremely accurate measurement of line-end tip-to-tip features with improved repeatability, even for high-noise and low contrast images

  • Extremely accurate measurement of defectivity for lines/spaces, contacts/pillars and tip-to-tip features for any size data sets up to millions of features

  • Measurement of local CDU, global CDU, local edge placement error (EPE), pattern placement error and many other key metrics, accurate even for high-noise and low contrast images

  • More accurate determination of best focus/best dose using Fractilia’s patented Probabilistic Process Window capability

  • Accurate metrology for large field-of-view images (images with large systematic across-SEM-field variations)

  • Reduced resist shrinkage by using lower-dose SEM measurements at the same accuracy/precision

  • More accurate calibration of OPC models

  • Accuracy on any patterning technology at any node at any process step for both ADI and AEI: EUV, high-NA EUV, 193, 193i, SADP, SAQP, SAOP, DSA, and more

Benefits from R&D through manufacturing

Fractilia embeds the FILM™ technology and other proprietary capabilities into our MetroLER™ and FAME™ solutions, creating enormous benefits throughout the entire semiconductor lifecycle.

Contact us for more information or to schedule a demonstration.