For Immediate Release
Austin, TX – February 23, 2026 — Fractilia, the industry leader in high-accuracy stochastics metrology and control, today announced that its FAME 300™ system has been adopted for production use by a top-five semiconductor device maker, marking the first time an in-line stochastics control solution has been fully integrated into a modern manufacturing environment.
Press Releases
FAME adopted in production
February 23, 2026
FAME has been adopted into production at a top-5 device maker
the Stochastics gap
July 15, 2025
Fractilia offers a roadmap to address uncontrolled random patterning variations costing manufacturers hundreds of millions of dollars per fab in lost yield and delayed production
FAME OPC
June 11, 2024
Fractilia announces FAME OPC to automate the accurate measurement of stochastics for the OPC use case
FRACTILIA OVERLAY PACKAGE
June 12, 2023
Fractilia is proud to announce our Fractilia Overlay Package which provides the most accurate and precise measurement of SEM-based overlay
FAME 300
February 21, 2023
Fractilia is proud to announce our FAME 300 product for high-volume manufacturing
FRACTILIA CHALLENGE
December 6, 2022
Fractilia dares chipmakers to take the Fractilia Challenge for up to 20x better scanning electron microscope matching and higher throughput at no obligation
FAME 3.0
March 21, 2022
Fractilia announces the release of FAME version 3.0
METRO LER 1.5
February 19, 2018
Contact hole measurement and analysis capability released in MetroLER version 1.5
METRO LER 1.0
July 6, 2017
Fractilia releases MetroLER version 1.0
press relations
CAYENNE GLOBAL
Michelle Clancy Fuller+1 (503) 702-4732michelle.clancy@cayennecom.com