The Stochastics Control Company
The leader in stochastics metrology and control solutions
More than half of the total error budget of latest-generation semiconductor manufacturing is often due to stochastics — the inherent randomness of the process. It is absolutely critical for device makers to minimize and control stochastic variability during process development, ramp and full-scale production.
The required first step to minimizing and controlling stochastic variability is to make measurements with accuracy and precision. But measuring stochastics is extremely difficult due to the nature of these measurements and the impact of metrology tool errors on them.
Fractilia solves this problem. By combining our patented edge detection technology with true computational metrology, our products measure all four stochastic effects with the accuracy and precision you need to control your manufacturing processes.
The benefits are enormous from R&D through manufacturing.
Fractilia’s solutions provide the highest accuracy and precision of stochastics measurements and are used to solve issues from process development through high volume production.
Unique and proven technology
FILM — an enabling technology
Fractilia’s patented FILM technology is a physics-based algorithm for edge detection that rejects noise without resorting to statistical filtering or smoothing. The result is robust edge detection without modifying the true characteristics of the feature edge you are detecting.
Highest signal to noise
Fractilia’s third-generation FILM model provides the highest signal-to-noise of any edge detection methodology in the industry.
Measures and subtracts out SEM errors
The noise in a SEM image adds to the uncertainty of the measurement and produces an inflated, biased result. The amount of this noise changes with nearly everything — process conditions (e.g., dose/focus), feature size, SEM settings, SEM tools, etc. Fractilia fixes this problem by measuring the random noise in a SEM image and then statistically removing the noise to produce a far more accurate unbiased measurement. Systematic SEM errors are also measured and removed.
No user-defined parameters
Unlike other tools, Fractilia’s products are self-calibrating and require no user-defined input parameters. This capability allows all measurements to be fully automated and provides the same accurate results across all users. In addition, all measurements and analyses are completely repeatable.
Robust solutions
Our FAME and MetroLER products also include hundreds of other unique and proprietary capabilities that have been developed and tested on millions of SEM images by customers worldwide over many years. Our attention to detail results in the most accurate, robust and easy-to-use products available.
Measure what is on the wafer, not what is on the SEM image
Fractilia’s solutions provide:
The de-facto industry standard for unbiased roughness measurements (LWR, LER, PSD(0), etc.)
High-precision CD measurement, with systematic and random SEM errors removed
Extremely accurate measurement of line-end tip-to-tip features with improved repeatability, even for high-noise and low contrast images
Extremely accurate measurement of defectivity for lines/spaces and contacts/pillars for any size data sets up to millions of features
Measurement of LCDU, GCDU, EPE, Pattern Placement Error and many other key metrics, accurate even for high-noise and low contrast images
Accurate metrology for large field-of-view images (images with large systematic across-SEM-field variations)
Reduced resist shrinkage by using lower-dose SEM measurements at the same accuracy/precision
More accurate calibration of OPC models
Accuracy on any patterning technology at any node at any process step : EUV, 193, 193i, SADP, SAQP, SAOP, DSA, and more
Benefits from R&D through manufacturing
Contact us for more information or to schedule a demonstration.