Faster process development

MetroLER quickly and accurately identifies the optimal process conditions that minimize roughness, defectivity, LCDU, SEM overlay and other metrics impacted by the effects of stochastics. Use cases include optimizing the scanner as well as etch and metrology tool settings.

Material evaluation and selection

Use MetroLER to optimize the selection of resists and other materials by minimizing the impact of roughness and stochastics.

Reduce resist shrinkage and increase metrology tool throughput

Since MetroLER can provide accurate results even for high-noise and low contrast images, it can be used to make measurements at a lower SEM dose. This results in less resist shrinkage and higher SEM throughput.

Defectivity Measurement
& Analysis

MetroLER automatically detects bridges and breaks for line/space patterns as well as missing and merged contacts and pillars. MetroLER predicts the fraction of missing contacts and can be used to compare and optimize processes for minimum defectivity.

Stop Chasing Noise

Customers who use MetroLER throughout their organization report significant savings by standardizing their measurement methodology using Fractilia. Each engineer can save hours per week and spend more time solving real process problems rather than chasing noise in their measurements.

SEM tool fleet matching

MetroLER measures SEM errors (including noise, distortion, background variation and scan errors) and can be used to perform metrology tool troubleshooting and fleet matching, even across SEM vendors and SEM models.

Migrate your measurements to production

When you are ready to move your process to pilot line or production, you can reuse all your MetroLER measurements for process monitoring and control by using our FAME fab-wide solution.