Introducing FAME 300: Stochastics control for HVM

FAME 300 provides measurements for real-time process control as well as process and tool monitoring

FAME 300 delivers Fractilia’s highly accurate and precise measurements of stochastics to high volume manufacturing. FAME 300 deploys a Linux Kubernetes cluster to provide the throughput, uptime and latency required for in-line process control, process and tool monitoring and many other use cases.

FAME 300 is fully scalable and is capable of measuring all SEM images from an entire fab — including CD SEM’s and large-field SEM’s from any SEM vendor and SEM generation. FAME 300 fully integrates into the customer’s Host/MES system and automatically outputs accurate results that can be used by the customer’s SPC systems, machine learning models and other automated systems.

Using Fractilia’s patented FILM™ technology, customers receive more than 170 high-accuracy SEM measurements such as unbiased LWR, unbiased LER, unbiased LCDU, CD and defectivity. In addition, FAME 300 can provide up to 20x improvement in SEM tool matching and up to 30% throughput improvement for SEM tools.

Customers can also combine FAME 300 with the optional Fractilia Overlay Package for the highest accuracy and precision SEM overlay measurements in HVM.

FAME 300 is a configuration of the FAME 3XX family of products. The system is configured for the needs of each individual customer. Please see our press release here.

FAME 3XX can measure all SEM images from an entire fab and provide the highest accuracy and precision for stochastics and other measurements with the uptime and latency required for HVM fabs.

Benefits

Improve Scanner OEE

Use Fractilia’s patented probabilistic process windows to accurately center your processes for optimum performance which can improve scanner OEE.

Reduce Opex/Capex

Mix and match metrology tool vendors and tool models while increasing SEM throughput 30% or more. FAME 300 provides accuracy and precision for any SEM tool from any vendor or generation.

Improve Process Control

Use FAME 300 outputs for in-line process control using 170+ accurate measurements of CD, roughness and stochastics that was not previously possible. Fractilia’s measurements have numerous uses including identifying process excursions and as inputs into AI/ML control systems.

SEM tool fleet matching

FAME 300 can improve SEM tool matching by up to 20x. Since FAME 300 provides accurate measurements regardless of SEM tool, model or vendor, you can use FAME 300 as the “Ruler” to compare results and track the health of your SEM fleet either in a single fab or between different fabs. FAME 300 provides automated SEM tool health monitoring on more than 10 critical tool metrics.

Migrate R&D measurements to HVM

FAME 300 allows customers to transfer all Fractilia measurements from R&D directly to ramp and HVM using the same measurement engine.