Tutorials

Watch these video tutorials to learn about pattern roughness, MetroLER and the technology behind its revolutionary capabilities.

Introducing MetroLER:

Part 1:  Why MetroLER is needed

Part 2:  Why measuring 3σ is not good enough

Part 3:  Detecting Edges with the Fractilia Inverse Linescan Model (FILM)

Part 4:  Subtracting SEM errors

Part 5:  Predicting the impacts of roughness

Part 6:  Using MetroLER

 

Best Known Methods

Line/Space Roughness Measurement Data Collection BKM

Papers

Read these papers and presentations for more technical details on pattern roughness and MetroLER.

Unbiased roughness measurements: subtracting out SEM effects (MNE 2017)
Gian F. Lorusso, Vito Rutigliani, Frieda Van Roey, Chris A. Mack

Reducing roughness in EUV lithography (EUVL Symposium 2017)
Chris A. Mack

More on stochastics and the phenomenon of line-edge roughness (Photopolymer 2017)
Chris A. Mack

Stochastics and the phenomenon of line-edge roughness (SPIE 2017)
Chris A. Mack

Using the analytical linescan model for SEM metrology (SPIE 2017)
Chris A. Mack, Benjamin D. Bunday

Global minimization line-edge roughness analysis of top down SEM images (SPIE 2017)
Barton G. Lane, Chris A. Mack, Nasim Eibagi, Peter Ventzekn

Level crossing methodology applied to line-edge roughness characterization (SPIE 2017)
Chris A. Mack, Timothy A. Brunner, Xuemei Chen, Lei Sun

Impact of stochastic process variations on overlay mark fidelity towards the 5nm node (SPIE 2017)
Michael E. Adel,  Roel Gronheid, Chris A. Mack, et al.

 

Additional Resources

More than two dozen published papers covering LER and related topics are available on Chris Mack's website.