Watch these video tutorials to learn about MetroLER and the technology behind its revolutionary capabilities.
Part 1: Why MetroLER is needed
Part 4: Subtracting SEM errors
Part 6: Using MetroLER
Read these papers and presentations for more technical details on MetroLER and its use.
Using the analytical linescan model for SEM metrology
Chris A. Mack, Benjamin D. Bunday
Global minimization line-edge roughness analysis of top down SEM images
Barton G. Lane, Chris A. Mack, Nasim Eibagi, Peter Ventzekn
Level crossing methodology applied to line-edge roughness characterization
Chris A. Mack, Timothy A. Brunner, Xuemei Chen, Lei Sun
Impact of stochastic process variations on overlay mark fidelity at the 5nm node
Michael E. Adel, Chris A. Mack, Sharon Aharon, Dana Klein, Philippe Leray
More than two dozen published papers covering LER and related topics are available on Chris Mack's website.