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EUV's New Problem Areas
,
by Mark Lapedus in Semiconductor Engineering
February 19, 2018:
Contact hole measurement and analysis capability released
in MetroLER version 1.5
See MetroLER results at the 2018 SPIE Advanced Lithography Conference:
Download a schedule of technical papers with results from MetroLER -- Updated February 21, 2018
Conquering LER with computational metrology
:
Chris Mack's video conversation with Dan Hutcheson on weVISION
July 6, 2017:
Fractilia releases MetroLER
version 1.0
Fractilia: Pattern Roughness Metrology
, by Mark Lapedus in Semiconductor Engineering
SPIE Newsroom video
: Chris Mack -- Stochastics and the phenomenon of line-edge roughness
SPIE Newsroom video
on Fractilia