Papers and events of interest at 2019 SPIE Advanced Lithography: Download

January 10, 2019: Fractilia releases MetroLER version 1.8.0 with new analysis capabilities along with significantly enhanced usability. Contact Fractilia for more information.

November 16, 2018: Fractilia releases MetroLER version 1.7.7 with even greater accuracy, faster execution speed and new feature analysis capabilities. Contact Fractilia for more information.

EUV's New Problem Areas, by Mark Lapedus in Semiconductor Engineering

February 19, 2018: Contact hole measurement and analysis capability released in MetroLER version 1.5

See MetroLER results at the 2018 SPIE Advanced Lithography Conference: Download a schedule of technical papers with results from MetroLER -- Updated February 21, 2018

Conquering LER with computational metrology: Chris Mack's video conversation with Dan Hutcheson on weVISION

July 6, 2017: Fractilia releases MetroLER version 1.0

Fractilia: Pattern Roughness Metrology, by Mark Lapedus in Semiconductor Engineering

SPIE Newsroom video:  Chris Mack -- Stochastics and the phenomenon of line-edge roughness

SPIE Newsroom video on Fractilia